English
Precision Platform Panel is a core component in precision engineering and automation equipment, which refers to a basic load-bearing platform with high-precision dimensional control, high flatness/verticality/parallelism tolerances, excellent Material stability, and multi environmental adaptability. Its core components include:
Matrix materials: high-strength alloys (such as aviation aluminum 7075-T6, stainless Steel 304/316L), granite, carbon fiber composite materials, etc;
Surface treatment: precision grinding, hard chrome plating, oxidation treatment, PVD coating, etc;
Auxiliary structures: embedded guide rail slots, positioning pin holes, threaded hole arrays, vacuum suction holes, sensor installation positions, etc.
2、 Core features and data support
Characteristics, Professional Data, and Typical Application Scenarios
High flatness and positional tolerance flatness ≤ 0.005mm (200 × 200mm range), perpendicularity/parallelism ≤ 0.01mm/m, suitable for precision assembly and optical calibration. Semiconductor wafer testing platform, optical lens grinding base
Thermal stability and expansion coefficient: The thermal expansion coefficient is ≤ 1.2 × 10 ⁻⁵/℃ (20-100 ℃), and with constant temperature design, the size change can be controlled within ± 0.002mm/℃. Laser interferometer optical path platform, ultra precision machine tool bed
High rigidity and load capacity. Static stiffness ≥ 150N/μ m, dynamic stiffness ≥ 80N/μ m, capable of carrying loads of 50-500kg, suitable for heavy-duty precision positioning. Industrial robot seventh axis base, CNC Machining center worktable
Micro vibration suppression natural frequency ≥ 200Hz, damping ratio ≥ 0.05, effectively isolating environmental vibrations from 0.5-100Hz, ensuring nanometer level positioning accuracy. Electron microscope shock mount, atomic force microscope scanning platform
Surface roughness and cleanliness: Surface roughness Ra ≤ 0.1 μ m, treated with electropolishing/nano coating, can meet the requirements of Class 100 cleanroom. Biochip preparation platform, semiconductor lithography mask base
Modular expandability supports M6/M8 threaded hole arrays (spacing 25mm/50mm), vacuum adsorption holes (hole diameter φ 1- φ 3mm), and quick connection of guide rails. Automated production line rapid changeover tooling, multi axis motion platform splicing
3、 Key technical parameters
dimensional accuracy
Length/width tolerance: ± 0.01mm (within 500mm), ± 0.02mm (500-1000mm);
Diagonal deviation: ≤ 0.03mm/m (full size range).
Case: In wafer transfer robots, the deviation of the base size needs to be controlled within ± 0.01mm to avoid interference from the movement of the robotic arm.
Dynamic response
Resonant frequency: ≥ 300Hz (lightweight design), ≥ 150Hz (heavy-duty type);
Dynamic positioning error: ≤± 0.5 μ m (100mm stroke, 1m/s speed).
Case: The high-speed surface mount machine requires a sliding table resonance frequency of ≥ 250Hz to achieve a mounting speed of 100000 times per hour.
Environmental adaptability
Corrosion resistance: Neutral salt spray test ≥ 500 hours (stainless steel material);
Vacuum compatibility: Exhaust rate ≤ 1 × 10 ⁻⁹ Pa · m ³/s (granite/ceramic material);
Radiation resistance: Total dose ≥ 100kRad (Si) (aerospace grade material).
Case: The reflector base of a space telescope needs to meet radiation resistance requirements to ensure dimensional stability throughout its 10-year lifespan.
4、 Application scenarios and cases
Semiconductor Manufacturing
Lithography machine mask base: made of microcrystalline glass material, with a flatness of ≤ 0.003mm, and equipped with an active temperature control system to achieve ± 0.001mm level thermal expansion compensation.
Wafer Inspection Platform: Integrated with vacuum adsorption and multi axis motion modules, supporting automatic focusing and defect scanning for 200mm/300mm wafers.
Precision optical processing
Non spherical mirror machining table: using granite substrate and air floating guide rail, with a flatness of ≤ 0.002mm, and combined with a laser interferometer to achieve a surface shape accuracy of λ/20 (λ=632.8nm).
Telescope main mirror assembly platform: Made of carbon fiber composite material, the weight is reduced by 40%, and the thermal expansion coefficient matches the mirror body material to ensure the stability of the main mirror support.
BioMedical devices
Cell manipulation microfluidic platform: The base surface is coated with a hydrophobic layer, with a contact angle of ≥ 120 °, and coupled with micrometer level positioning accuracy, it achieves single-cell capture and culture.
Surgical robot positioning table: integrated with six axis force sensors and visual guidance system, with a positioning repeatability of ≤ 0.01mm, meeting the millimeter level operation requirements of minimally invasive surgery.
Quantum technology field
Ionic trap chip support platform: using non-magnetic stainless steel+yttrium oxide ceramic composite structure, vacuum leakage rate ≤ 1 × 10 ⁻¹¹ Pa · m ³/s, combined with superconducting magnets to achieve precise control of quantum bits.
Cold atom interferometer base: resonant frequency ≥ 500Hz, vibration suppression bandwidth covering 0.1-1kHz, ensuring μ Gal level gravity acceleration measurement accuracy.
